发明名称 |
Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials |
摘要 |
A new cleaning chemistry based on bis-choline and tris-choline compounds, such as their hydroxides, is provided in order to address the removal of photoresist and flux while minimizing any etching of the substrate.
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申请公布号 |
US2004147421(A1) |
申请公布日期 |
2004.07.29 |
申请号 |
US20030689657 |
申请日期 |
2003.10.22 |
申请人 |
CHARM RICHARD WILLIAM;ZHOU DE-LING;SMALL ROBERT J.;LEE SHIHYING |
发明人 |
CHARM RICHARD WILLIAM;ZHOU DE-LING;SMALL ROBERT J.;LEE SHIHYING |
分类号 |
C11D7/32;C11D7/34;C11D11/00;G03F7/42;(IPC1-7):C11D1/00 |
主分类号 |
C11D7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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