发明名称 |
THIN-FILM TRANSISTOR AND ITS MANUFACTURING METHOD, AND FLAT-PANEL DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To suppress degrading of characteristic of a TFT due to hot carriers generated at the edge of the drain area of the TFT. SOLUTION: The TFT is provided with a polysilicon layer 3 as a semiconductor layer formed on an insulative substrate 1, a gate electrode 5 formed on the polysilicon layer 3 with a gate insulation film 4 in between, a channel area 31 in the semiconductor layer 3 under the gate electrode 5, and a source area 32 and a drain area 33 formed in the polysilicon layer 3 on both sides of the channel area 31. The thicknesses T<SB>1</SB>of the polysilicon layer 3 on both sides of the source area 32 side or the drain area 33 side are made larger than that T<SB>2</SB>of the polysilicon layer 3 under the central part of the gate electrode 5, and a boundary B where the polysilicon layer 3 becomes large in thickness is located under the gate electrode 5. COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004207452(A) |
申请公布日期 |
2004.07.22 |
申请号 |
JP20020374079 |
申请日期 |
2002.12.25 |
申请人 |
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO LTD |
发明人 |
ENDO NAOHIKO;KETSUSAKO MITSUNORI |
分类号 |
G02F1/1368;G09F9/00;G09F9/30;H01L21/336;H01L29/786;(IPC1-7):H01L29/786;G02F1/136 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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