METHOD FOR PRODUCING FILM COMPRISING LONG CYLINDRICAL PORES ALIGNED BY ELECTRIC FIELD

摘要

PURPOSE: Provided are a method for industrially producing low dielectric constant of thin film material having excellent insulation property and mechanical strength, and a low dielectric constant of thin film produced by the method. CONSTITUTION: The method comprises the steps of (i) preparing an aqueous solution of worm-like micelle precursor comprising surfactant and salt bonded with polar head group of the surfactant, (ii) mixing a silicate and an acid with the aqueous solution to form a mixture, (iii) filling a plane-parallel capillary which consists of top/lower bases of electrode and has a thickness of several micrometers, with the mixture, (iv) applying ac(f=1 kHz) voltage of 10-20 volts to the capillary, and maintaining the applied voltage for 1-10 minutes, so as to obtain a solid porous film, and (v) removing the top base from the solid porous film, and firing the film at 350-600 deg.C for 30 minutes to 12 hours.