发明名称 THIN FILM TRANSISTOR SUBSTRATE WITH DUAL GATE TO IMPROVE CHEMICAL RESISTANCE OF GATE
摘要 PURPOSE: A TFT(Thin Film Transistor) substrate is provided to improve chemical resistance of a gate by using a dual gate structure composed of molybdenum and aluminum alloys. CONSTITUTION: A dual gate(20) is formed on a glass substrate(1), wherein a lower gate layer(21) is composed of an aluminum alloy and an upper gate layer(22) is composed of a molybdenum alloy to prevent damage of the lower layer. A gate insulating layer(2) is formed on the resultant structure. A semiconductor layer(3) is formed on the gate insulating layer to overlap the dual gate. A source(5) and a drain(6) are formed on the semiconductor layer spaced apart from each other. A pixel electrode(8) is connected to the drain.
申请公布号 KR100441839(B1) 申请公布日期 2004.07.16
申请号 KR19960055069 申请日期 1996.11.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG, CHANG O
分类号 H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L29/786
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