发明名称 |
THIN FILM TRANSISTOR SUBSTRATE WITH DUAL GATE TO IMPROVE CHEMICAL RESISTANCE OF GATE |
摘要 |
PURPOSE: A TFT(Thin Film Transistor) substrate is provided to improve chemical resistance of a gate by using a dual gate structure composed of molybdenum and aluminum alloys. CONSTITUTION: A dual gate(20) is formed on a glass substrate(1), wherein a lower gate layer(21) is composed of an aluminum alloy and an upper gate layer(22) is composed of a molybdenum alloy to prevent damage of the lower layer. A gate insulating layer(2) is formed on the resultant structure. A semiconductor layer(3) is formed on the gate insulating layer to overlap the dual gate. A source(5) and a drain(6) are formed on the semiconductor layer spaced apart from each other. A pixel electrode(8) is connected to the drain.
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申请公布号 |
KR100441839(B1) |
申请公布日期 |
2004.07.16 |
申请号 |
KR19960055069 |
申请日期 |
1996.11.18 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG, CHANG O |
分类号 |
H01L29/786;(IPC1-7):H01L29/786 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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