| 摘要 |
The invention includes a method for placement of sidelobe inhibitors on a radiation-patterning tool. Elements of the tool are represented by design features in a modeling domain. The modeling domain is utilized to generate vectors spanning between edges of design features within a threshold spatial distance of one another. Locations of vector midpoints are identified. The locations are utilized in identifying areas where sidelobe overlap is likely. The areas are shifted from the modeling domain to a real domain, and in the real domain correspond to regions of the tool where sidelobe overlap is likely to occur. Sidelobe inhibitors are formed across at least some of the identified regions of the tool. The invention includes computer readable code that can enable a computer to determine locations for placement of the sidelobe inhibitors.
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