| 摘要 |
PROBLEM TO BE SOLVED: To form a uniform metal film regardless of the condition of raw material gas plasma. SOLUTION: In the member 21 to be etched, the numerical aperture as the ratio of the area of aperture parts to the whole area opposite in the whole face opposite to the side of a substrate 3 in a plane view state is set in accordance with the condition of raw material gas plasma, and the production of a uniform metal film is performed without according to the condition of the raw material gas plasma. COPYRIGHT: (C)2004,JPO&NCIPI
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