发明名称 |
SURFACE ASPERITY FORMING METHOD, OPTICAL FILM OBTAINED BY THE SAME, DIFFUSE REFLECTION PLATE, AND ROUGHENED SURFACE FILM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method by which an exposed surface of a substrate can easily be formed at low cost and a resin surface asperities can be formed at the same time, an optical film obtained by the method, a diffuse reflection plate, and a roughened surface film. <P>SOLUTION: The surface asperity forming method conforming with a mask pattern includes the stages of: forming an energy-sensitive negative resin composition layer 3 containing at least one or more kinds of polymerizable monomer or oligomer; irradiating a place other than where the energy-sensitive negative resin composition layer 5 is removed with an active energy beam; performing irradiation with an active energy beam at least one or more times through a pattern-formed mask 6; etching the energy-sensitive resin composition layer which is not irradiated with the active energy beam 4; and post-heating it. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004198989(A) |
申请公布日期 |
2004.07.15 |
申请号 |
JP20020370620 |
申请日期 |
2002.12.20 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
KIZAWA KEIKO;NOJIRI TAKESHI;IWAMURO MITSUNORI |
分类号 |
G02B5/02;C08F291/00;G02F1/1335 |
主分类号 |
G02B5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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