发明名称 High Q inductor with faraday shield and dielectric well buried in substrate
摘要 Inductor losses to a semiconducting substrate are eliminated in an IC structure by etching a well into the substrate down to the insulating layer coating the substrate and fabricating a grounded Faraday shield in the shape of elongated segments in the bottom of the well. The well lies directly below the inductor and is optionally filled with cured low-k organic dielectric or air.
申请公布号 US6762088(B2) 申请公布日期 2004.07.13
申请号 US20030336291 申请日期 2003.01.03
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 ACOSTA RAUL E.;LUND JENNIFER L.;GROVES ROBERT A.;ROSNER JOANNA;CORDES STEVEN A.;CARASSO MELANIE L.
分类号 H01F41/04;H01F17/00;H01F17/02;H01F27/36;(IPC1-7):H01L21/20 主分类号 H01F41/04
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