DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM, A CONTAINER THEREFOR, AND A MICROLITHOGRAPHY PROJECTION EXPOSURE MACHINE

摘要

The invention relates to a device and a method for the optical measurement of an optical system (1), in particular an optical imaging system, the device comprising one or more object-side test optics components (2a, 2b) to be arranged in front of the optical system to be measured, and/or one or more image-side test optics components (3, 4, 5) to be arranged behind the optical system to be measured, to a container for use in such a device, to a microlithography projection exposure machine equipped with such a device, and to a method which can be carried out with the aid of this device. According to the invention, an immersion fluid can be introduced adjacent to at least one of the one or more object-side test optics components and/or image-side test optics components. Use, for example, for the optical measurement of microlithography projection objectives of high numerical aperture by means of wavefront detection using shearing or point diffraction interferometry or a Moiré measuring technique.