发明名称 |
Arrangement for isostatic suspension of optical elements on support for microlythography apparatus has approximately greatest part of first component load on second carried at point that determines degrees of freedom in 2 planes |
摘要 |
The arrangement has at least the approximately greatest part of the load of the first component on the other carried at a point determining degrees of freedom of components relative to each other in first 2 of 3 orthogonal planes. The degrees of freedom in respect of the third direction and rotation about an axis of the first direction are determined by 2 connections in the same plane perpendicular to the first direction as the largest load point. The arrangement has at least the approximately greatest part of the load of the first component on the other component carried at a point (1) that determines the degrees of freedom of the components relative to each other in first and second of three orthogonal planes. The degrees of freedom in respect of the third orthogonal direction and a rotation about an axis of the first direction are determined by two connections (13) in the same plane perpendicular to the first direction as the greatest load point.
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申请公布号 |
DE10259172(A1) |
申请公布日期 |
2004.07.08 |
申请号 |
DE20021059172 |
申请日期 |
2002.12.18 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
MAUL, GUENTER |
分类号 |
G02B7/00;(IPC1-7):G12B3/04;G12B5/00 |
主分类号 |
G02B7/00 |
代理机构 |
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