| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for a resist underlayer film excellent in storage stability for obtaining a resist underlayer film which ensures no resist peeling, improves pattern reproducibility, and has alkali resistance and resistance to oxygen ashing in resist removal when disposed under a resist. <P>SOLUTION: The composition for a resist underlayer film comprises (A) a hydrolysis-condensation product of an alkoxysilane mixture including a compound represented by the formula (1): Si(OR<SP>2</SP>)<SB>4</SB>and a compound represented by the formula (2): R<SP>1</SP><SB>n</SB>Si(OR<SP>2</SP>)<SB>4-n</SB>and (B) a hydrolysis-condensation product of at least a compound represented by the above formula (2). In the formula (1), symbols R<SP>2</SP>may be the same or different and each represents a monovalent organic group. In the formula (2), symbols R<SP>1</SP>may be the same or different and each represents a monovalent organic group or H; symbols R<SP>2</SP>may be the same or different and each represents a monovalent organic group; and n is an integer of 1-2. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
