| 摘要 |
PURPOSE: A cataoptric projection optical system, an exposure apparatus, and a device manufacturing method are provided to improve exposure characteristics by reducing non-uniformity of illumination and resolution on a wafer surface. CONSTITUTION: A cataoptric projection optical system(100B) projects a reduced size of a pattern on an object surface onto an image surface, and includes eight mirrors, that is, in an order from the object surface side to the image surface side, first through eighth mirrors(110¯180). The cataoptric projection optical system, forms an intermediate image between the sixth mirror and the seventh mirror on an optical path. A position in a height direction of a principal ray from an optical axis at each mirror is displaced. A displacement direction from the first mirror to the fourth mirror is reverse to that from the fifth mirror to the eight mirror. The second through fifth mirrors are concave, convex, concave and concave mirrors, respectively. The seventh and eighth mirrors are convex and concave mirrors, respectively. The second mirror among these eight mirrors is located closest to the object surface side.
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