| 摘要 |
PURPOSE: A method is provided to improve alignment accuracy in manufacturing process of a semiconductor device by using an image filter. CONSTITUTION: When an alignment key is located at a setting position in reading the alignment key of a wafer of an exposure equipment, a signal generated in the alignment key is sensed by using an image filter. The image filter is one selected from group consisting of a gaussian filter, a median filter, a vertical summation filter, a sobel filter, a band restore filter, a laplaceian add filter, a dilate filter, and a frame filter.
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