发明名称 ALIGNMENT PATTERN, METHOD FOR FORMING IT AND IMAGE FORMING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To highly accurately detect color slippage by a simple and inexpensive configuration. <P>SOLUTION: An alignment pattern Pm is constituted by successively forming patches obtained by making the relative positional relationship of the line images of two colors deviate per an arbitrary amount by taking a plurality of lines formed by overlapping the line image Bk of black which is a reference color and the line image C of a color other than the reference color, for instance, cyan as one patch. The line width of the alignment pattern is formed so as to satisfy a relation: (line width)<(photodetective width)&times;(5.0627&times;(write-in density (dpi))<SP>-0.5331</SP>) as the relation between the write-in density of an image forming apparatus and the light receiving width of an alignment pattern detecting means, and a factor by the relation between the line width deteriorating the linearity of two straight lines for the arbitrary shift amount of the line image of the color other than the reference color and the light receiving width is reduced. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004184461(A) 申请公布日期 2004.07.02
申请号 JP20020347814 申请日期 2002.11.29
申请人 RICOH CO LTD 发明人 ISHIBASHI HITOSHI;SAWAYAMA NOBORU
分类号 B41J2/21;B41J29/46;G03G15/00;G03G15/01;G03G15/16;G03G21/14 主分类号 B41J2/21
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