| 摘要 |
PURPOSE: A fume collector of residual gas for a wafer manufacturing chamber is provided to be capable of minimizing the generation of residual gas and filtering the particles of nitrogen gas for preventing the particles from flowing to the chamber. CONSTITUTION: A fume collector of residual gas for a wafer manufacturing chamber is provided with a louver heater(4) installed at the outer surface of a wafer manufacturing chamber(1) for heating the chamber, a manometer and a regulator loaded to a distribution supply line in series for supplying predetermined pressure gas and preventing pressure drop, a purge line part connected with a flow control valve and a stop valve in series, and a vent line part connected with the purge line part in parallel. The fume collector further includes a filter(25) connected with one end portion of an exhaust line(14) for filtering particles and a heater block(30) connected with the other end portion of the exhaust line for heating the nitrogen gas supplied to the wafer manufacturing chamber.
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