发明名称 CVD material compound and method for manufacturing the same, and CVD method of iridium or iridium compound thin film
摘要 The present invention relates to a raw material for CVD comprising an organic iridium compound as a main component, said organic iridium compound being tris(2,4-octanedionato)iridium represented by Formula 1. Particularly preferably, the raw material for CVD consists only of the trans isomer of tris(2,4-octanedionato)iridium.
申请公布号 US6753437(B1) 申请公布日期 2004.06.22
申请号 US20030348345 申请日期 2003.01.22
申请人 TANAKA KIKINZOKU KOGYO K.K. 发明人 SAGAE TAKEYUKI;TANIUCHI JUN-ICHI
分类号 C07C49/92;C23C16/18;C23C16/40;(IPC1-7):C07F15/00;C23C16/00 主分类号 C07C49/92
代理机构 代理人
主权项
地址