| 发明名称 |
ANTIALLERGIC COMPOSITION FOR INSTILLATION OR RHINENCHYSIS |
| 摘要 |
PROBLEM TO BE SOLVED: To obtain a composition for instillation or rhinenchysis favorably using cetirizine. SOLUTION: This composition for instillation or rhinenchysis comprises ä2-[4-((4-chlorophenyl)phenylmethyl)-1-piperazinyl]ethoxy}acetic acid of the formula or a salt thereof and a surfactant for suppressing irritation. COPYRIGHT: (C)2004,JPO
|
| 申请公布号 |
JP2004168709(A) |
申请公布日期 |
2004.06.17 |
| 申请号 |
JP20020336714 |
申请日期 |
2002.11.20 |
| 申请人 |
NIDEK CO LTD |
发明人 |
ITO TERUHITO;KAWAI KATSUHIRO;KAKUBE HIROMI;SUGIURA MASAHIKO |
| 分类号 |
A61K47/10;A61K31/495;A61K47/32;A61K47/34;A61K47/38;A61P11/02;A61P27/14;A61P37/08;A61P43/00;(IPC1-7):A61K31/495 |
主分类号 |
A61K47/10 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
