发明名称 |
Method of achieving CD linearity control for full-chip CPL manufacturing |
摘要 |
A method of generating masks for printing a pattern including a plurality of features having varying critical dimensions. The method includes the steps of: (1) obtaining data representing the pattern; (2) defining a plurality of distinct zones based on the critical dimensions of the plurality of features; (3) categorizing each of the features into one of the plurality of distinct zones; and (4) modifying the mask pattern for each feature categorized into a predefined distinct zone of the plurality of distinct zones.
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申请公布号 |
US2004115539(A1) |
申请公布日期 |
2004.06.17 |
申请号 |
US20030659715 |
申请日期 |
2003.09.11 |
申请人 |
BROEKE DOUG VAN DEN;HSU CHUNGWEI;CHEN JANG FUNG |
发明人 |
BROEKE DOUG VAN DEN;HSU CHUNGWEI;CHEN JANG FUNG |
分类号 |
G03C5/00;G03F1/00;G03F9/00;G06F17/50;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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