| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method which can efficiently keep the image forming characteristic of a projection optical system keeping within an accuracy assurance range, when scanning exposure is performed. SOLUTION: The exposure method carries out the processing procedures comprising a first measurement step for measuring the image forming characteristic on a substrate of the projection optical system according to the position of a moving mask, a first setting step for setting a first correction amount to correct the image forming characteristic of the projection optical system based on the measurement result of the first measurement step, a second measurement step for measuring the positional error of the pattern of the mask which generates with time through the projection optical system, a second setting step for setting a second correction amount to correct the positional error of the pattern based on the measurement result in the second measurement step, and a correction step for integrally correcting the image forming characteristic of the projection optical system and the positional error of the pattern based on the first and second correction amount being set. COPYRIGHT: (C)2004,JPO |
