COMPOSITION FOR FORMING POROUS FILM, POROUS FILM, METHOD FOR PRODUCING THE SAME, INTERLAYER INSULATING FILM AND SEMICONDUCTOR APPARATUS

摘要

PROBLEM TO BE SOLVED: To obtain a composition for forming a porous film, from which a porous film having practical dynamic strength is formed by a simple process at a low cost is formed and the porous film and to provide a method for producing the same and a low-cost and high-performance semiconductor apparatus which has a built-in porous film and high reliability. SOLUTION: The composition for forming the porous film comprises a polymer obtained by hydrolytic condensation of one or more of silane compounds represented by general formula (1), preferably a polymer obtained by hydrolytic cocondensation of one or more of the silane compounds represented by general formula (1) and one or more of silane compounds represented by general formula (2). The method for producing the porous film comprises a process for coating the composition for forming the film and a process for forming porosity. COPYRIGHT: (C)2004,JPO