发明名称 RADIATION-SENSITIVE ELEMENTS AND THEIR STORAGE STABILITY
摘要 <p>Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on .at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a ,wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.</p>
申请公布号 WO2004049071(A1) 申请公布日期 2004.06.10
申请号 WO2003EP13431 申请日期 2003.11.28
申请人 KODAC POLYCHROME GRAPHICS GMBH.C.;KOTTMAIR, EDUARD;BAUMANN, HARALD;FLUGEL, MICHAEL;DWARS, UDO 发明人 KOTTMAIR, EDUARD;BAUMANN, HARALD;FLUGEL, MICHAEL;DWARS, UDO
分类号 B41C1/10;B41M5/46;G03F7/029;(IPC1-7):G03F7/029;B41M5/40 主分类号 B41C1/10
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