发明名称 REFLECTION TYPE ION ADHERING MASS SPECTROMETER
摘要 PROBLEM TO BE SOLVED: To provide a reflection type ion adhering mass spectrometer regarded as a general analyzing method capable of detecting a trace component with high measuring sensitivity, and widely applicable to industries by solving problems such as disturbance of a mass spectrometer, deterioration of a metal ion emitter, a device size, direct sampling and the like. SOLUTION: This reflection type ion adhering mass spectrometer is provided with a metal ion generating region 1, an adhesion region 2, and a mass spectrometry region 3, and the metal ion generating region and the mass spectrometer region are formed as a common region 10. The adhesion region is provided adjacently to the common region. An electrostatic field generating part 9 to form an electrostatic field to lead a metal ion introduced into the adhesion region from the metal ion generating region to the mass spectrometry region by making it reflect is provided in the adhesion region. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004158426(A) 申请公布日期 2004.06.03
申请号 JP20030095456 申请日期 2003.03.31
申请人 ANELVA CORP 发明人 HIRANO YOSHIKI;SHIOKAWA YOSHIRO
分类号 G01N27/62;H01J49/06;H01J49/10;H01J49/26;H01J49/40;H01J49/42;(IPC1-7):H01J49/26 主分类号 G01N27/62
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