发明名称 SEMICONDUCTOR WAFER SUPPORTING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor wafer supporting device by which traces of supporting pins do not occur on the back surface of a semiconductor wafer. SOLUTION: The semiconductor wafer supporting device comprises a disk-shaped supporting plate 2 on which the semiconductor wafer W is mounted, and a plate supporting base 3 which supports the supporting plate 2. The supporting plate 2 has on its surrounding portion 2a three or more notched grooves 2b which reach the inner side to the outer peripheral surface Wa of the semiconductor wafer W and through which the supporting pins P vertically moving can be partially entered, and the supporting pins P has a taper structure on its front end to hold the end face of the semiconductor wafer. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004158642(A) 申请公布日期 2004.06.03
申请号 JP20020322811 申请日期 2002.11.06
申请人 TOSHIBA CERAMICS CO LTD 发明人 TANABE ATSUSHI;NAGAHAMA HIROMI
分类号 H01L21/683;H01L21/22;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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