FLUORINE-CONTAINING PHOTOSENSITIVE POLYMER, RESIST COMPOSITION CONTAINING THE POLYMER AND PATTERN FORMATION METHOD USING THE COMPOSITION

摘要

PURPOSE: A fluorine-containing photosensitive polymer, a resist composition containing the polymer and a method for forming a pattern by using the composition are provided, to improve transmittance at F2 excimer laser wavelength (157 nm). CONSTITUTION: The fluorine-containing photosensitive polymer comprises a trifluorovinyl derivative monomer represented by the formula 6 as a repeating unit, and has a weight average molecular weight of 3,000-100,000, wherein X is a fluorine-substituted or unsubstituted alkyl group of C1-C5; R is a primary, secondary and tertiary alkyl group of C1-C10, a tetrahydropyranyl group, tetrahydrofuranyl group or 1-ethoxyethyl group; and n is an integer of 1-5. The composition comprises 100 parts by weight of the photosensitive polymer; 1-15 parts by weight of a photoacid generator; and optionally 0.01-2.0 parts by weight of an organic base.