ARC CHAMBER WITH PLURALITY OF BODY IN SOURCE HEAD OF ION IMPLANTING APPARATUS

摘要

PURPOSE: An arc chamber with a plurality of body in a source head of an ion implanting apparatus is provided to be capable of replacing a damaged part alone with new one as the arc chamber is damage. CONSTITUTION: An arc chamber(200) with a plurality of body is provided with an arc chamber substrate(170) for contacting an ion gas line of a source head through an ion gas inflow part(178), a substrate protecting part(160) inserted into the arc chamber substrate, and a fence. At this time, the fence includes a repeller guider(130) and a cathode guider(120) connected with the arc chamber substrate and spaced apart from an ion gas inlet port(180), and a pair of ion gas guiders connected with the lateral portions of the repeller and cathode guider in parallel. The arc chamber further includes an end plate(100) connected with the upper portion of the fence.