| 摘要 |
PROBLEM TO BE SOLVED: To obtain the subject resin having excellent performances for chemical amplification type positive type resist by controlling water content in a reaction system to a proper value. SOLUTION: A resin having a structural unit represented by formula I (R<1> and R<2> are each H, an aliphatic hydrocarbon, an alkoxy or a halogen; R<3> is H, an aliphatic hydrocarbon, an aryl, cyano, a halogen, etc.; X is an alkylene, an aryl or carbonyl) is reacted with an unsaturated compound represented by formula II [R<4> and R<5> are each H, an aliphatic hydrocarbon, an alkoxy, cyano or a halogen; R<6> is H, an aliphatic hydrocarbon, an alkoxy, a halogen, etc.; R<7> is an aliphatic hydrocarbon, a (substituted)alicyclic hydrocarbon, a trialkylsilyl, etc.] in the presence of an acid catalyst in a liquid phase in a water content of <=0.5wt.% preferably 0.001-0.5wt.%, Furthermore, a catalyst not substantially containing a metal, e.g. p-toluenesulfonic acid is preferably used as the acid catalyst. |
