| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing method, as well as substrate processing equipment that provides high processing capabilities. SOLUTION: This is a substrate processing method that comprises the steps of storing into a processing container 2 a substrate W, on whose surface an organic membrane 60 is formed, heating the substrate W, supplying ozone gas and water vapor into the processing container 2, changing the organic membrane 60 to be water-soluble, and washing the surface of the substrate W with water. Since a liquid membrane of a fluid with high processing abilities is generated on the surface of the substrate W, immediately prior to the processing, effective processing is applied on the substrate W. COPYRIGHT: (C)2004,JPO
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