| 摘要 |
PROBLEM TO BE SOLVED: To reduce the deviation in the counter spacing between an anode electrode and a cathode electrode on their heating. SOLUTION: The thin film production apparatus is provided with a reaction chamber, a gas introduction part of introducing a reaction gas into the reaction chamber, an exhaust part of exhausting the reaction gas inside the reaction chamber, planar first and second electrodes provided inside the reaction chamber, first and second supports each parallelly supporting the first and second electrodes, a high frequency power source part of applying high frequency electric power to the space between the first and second electrodes, and a heating part of heating either the first electrode or the second electrode. The electrode to be heated is mounted with a substrate requiring film deposition. At least either the first electrode or the second electrode is supported movably to a thermal expansion direction. COPYRIGHT: (C)2004,JPO
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