| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron-projecting lithography device which utilizing secondary electrons. SOLUTION: The electron-projecting lithography device is arranged at a predetermined distance from a substrate holder 12. Further, there are provided a secondary electron emitter 20 on the surface of which facing the substrate holder 12, a patterned mask 22 is formed, a primary electron emitter arranged at a predetermined distance from the secondary electron emitter in a direction opposite to that directed toward the substrate holder and emitting primary electrons to the secondary electron emitter 20, a secondary power supply for applying a predetermined voltage between the substrate holder and the secondary electron emitter, a primary power supply 51 for applying a predetermined voltage between the secondary electron emitter and the primary electron emitter, and a magnetic field generating device for controlling the passage of the secondary electrons emitted from the secondary electron emitter. Thus, the electron-projecting lithography device which utilizes the secondary electrons is constituted, which solves the problems wherein the size of a conventional exposure device is large, and the resolution degrades during the one-to-one projection. By using this, the electron-projecting lithography device utilizing secondary electrons is obtained, which solves, for example, the existing problems. COPYRIGHT: (C)2004,JPO
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