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发明名称 Lithographic apparatus
摘要 In a lithographic projection apparatus a seal member (12) surrounds a space between the final element of a projection system and a substrate table of the lithographic projection apparatus. A gas seal (16) is formed between said seal member and the surface of said substrate to contain liquid (11) in the space. <IMAGE>
申请公布号 EP1420298(A2) 申请公布日期 2004.05.19
申请号 EP20030257070 申请日期 2003.11.10
申请人 ASML NETHERLANDS B.V. 发明人 LOF, JOERI;DERKSEN, ANTONIUS, THEODORUS, ANNA, MARIA;HOOGENDAM, CHRISTIAAN, ALEXANDER;KOLESNYCHENKO, ALEKSEY;LOOPSTRA, ERIK, ROELOF;MODDERMAN, THEODORUS, MARINUS;MULKENS, JOHANNES, CATHARINUS, HUBERTUS;RITSEMA, ROELOF AEILKO, SIEBRAND;SIMON, KLAUS;DE SMIT, JOANNES, THEODOOR;STRAAIJER, ALEXANDER;STREEFKERK, BOB;VAN SANTEN, HELMAR
分类号 G03F7/20;G03F9/00 主分类号 G03F7/20
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