发明名称 |
Method of preparing thin supported films by vacuum deposition |
摘要 |
A method for preparing thin supported films by vacuum is disclosed. The method results in a substrate with windows. The windows are cutout (etched) areas that are covered by a thin film. The method for creating the substrate with thin film covering requires: masking off one surface of the metal substrate with a maskant; placing the metal substrate under a vacuum; treating the unmasked surface by plasma etching; coating the treated surface with a film while still under vacuum; removing substrate from vacuum; remove the masking; treating the previously masked side with photo resist; exposing the side treated with photo resist to artwork of a desired pattern; exposing the substrate to a suitable solution; chemically etching in areas selectively exposed by the artwork; neutralizing the substrate; and removing the etched parts from the substrate.
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申请公布号 |
US6737224(B2) |
申请公布日期 |
2004.05.18 |
申请号 |
US20010836794 |
申请日期 |
2001.04.17 |
申请人 |
STEWART JEFFREY |
发明人 |
STEWART JEFFREY |
分类号 |
C23C14/02;C23C14/04;C23C14/12;G03F1/14;(IPC1-7):G03F7/00;H01L21/00 |
主分类号 |
C23C14/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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