发明名称 DIFFUSION FURNACE HAVING HEATING PART
摘要 PURPOSE: A diffusion furnace having a heating part is provided to be capable of preventing the generation of residues at a cover part. CONSTITUTION: A diffusion furnace having a heating part is provided with a reaction chamber for loading a process object body, a diffusion furnace body part for enclosing the reaction chamber, and a cover part(124) for airtightly sealing the open end portion of the reaction chamber. The diffusion furnace further includes a resistance formed at the inner portion of the cover part for heating the cover part and a controlling part(130) for controlling the flow of current at the resistance. Preferably, the resistance is formed along the edge portion of the cover part. Preferably, the resistance is silicon rubber.
申请公布号 KR20040040968(A) 申请公布日期 2004.05.13
申请号 KR20020069356 申请日期 2002.11.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JIN, TAE SEONG;SEO, HO GEUN
分类号 H01L21/22;(IPC1-7):H01L21/22 主分类号 H01L21/22
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