发明名称 |
DIFFUSION FURNACE HAVING HEATING PART |
摘要 |
PURPOSE: A diffusion furnace having a heating part is provided to be capable of preventing the generation of residues at a cover part. CONSTITUTION: A diffusion furnace having a heating part is provided with a reaction chamber for loading a process object body, a diffusion furnace body part for enclosing the reaction chamber, and a cover part(124) for airtightly sealing the open end portion of the reaction chamber. The diffusion furnace further includes a resistance formed at the inner portion of the cover part for heating the cover part and a controlling part(130) for controlling the flow of current at the resistance. Preferably, the resistance is formed along the edge portion of the cover part. Preferably, the resistance is silicon rubber.
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申请公布号 |
KR20040040968(A) |
申请公布日期 |
2004.05.13 |
申请号 |
KR20020069356 |
申请日期 |
2002.11.08 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JIN, TAE SEONG;SEO, HO GEUN |
分类号 |
H01L21/22;(IPC1-7):H01L21/22 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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