发明名称 Positioning apparatus, charged particle beam exposure apparatus, and semiconductor device manufacturing method
摘要 <p>Positioning apparatus comprises: a first stage, capable of moving in a first direction and a second direction which is orthogonal to the first direction; a second stage, arranged on the first stage, and capable of adjusting a position and a rotation on the first stage; and a driving mechanism for positioning the second stage. The driving mechanism includes: a first electromagnet which generates first suction power; a second electromagnet, provided opposite to and away from the first electromagnet, which generates second suction power; and a core member, which is held movable between the first and second electromagnets, and moves by being pulled in accordance with the first and/or second suction power.</p>
申请公布号 EP1418017(A2) 申请公布日期 2004.05.12
申请号 EP20030255010 申请日期 2003.08.13
申请人 CANON KABUSHIKI KAISHA 发明人 KORENAGA, NOBUSHIGE
分类号 B23Q1/62;G03F7/20;H01J37/20;H01L21/00;H02K41/035;(IPC1-7):B23Q1/62 主分类号 B23Q1/62
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