发明名称 Ion source
摘要 An ion source (10) for producing a beam of ions from a plasma is disclosed. A plasma is created at the center of an annular anode (12) by collisions between energetic electrons and molecules of an ionisable gas. The electrons are sourced from a cathode filament (11) and are accelerated to the anode (12) by an applied electric potential. A magnetic field having an axis aligned with the axis of the anode acts to concentrate the flow of electrons to the center of the anode (12). The ionisable gas is introduced into the ion source (10) at the point of concentrated electron flow. Ions created in the resultant plasma are expelled from the ion source as an ion beam centered on the axis of the magnetic field. The surfaces of the anode are coated with an electrically conductive non-oxidising layer of Titanium Nitride to prevent a build up of an insulating layer on the anode.
申请公布号 US6734434(B1) 申请公布日期 2004.05.11
申请号 US20010744205 申请日期 2001.01.18
申请人 SAINTECH PTY LTD. 发明人 SAINTY WAYNE G
分类号 H01J27/02;H01J27/14;(IPC1-7):H01J49/10 主分类号 H01J27/02
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