| 摘要 |
PURPOSE: A vapor deposition apparatus is provided to restrain heat loss of a plate by using a seal ring and to protect metallic parts from process gas using a first seal surface and a second seal surface. CONSTITUTION: A vapor deposition apparatus includes a plate, a terminal, a first seal surface, a stem, a second seal surface, a cover, a conductor, a channel, and a seal ring. The plate(2) includes a heater(6). The terminal(8) for providing power to the heater is exposed from one surface of the plate. The first seal surface(12) surrounds the terminal. The stem(3) support the plate. The second seal surface(13) is formed along an end surface of the stem. The cover(17) blocks an opened end of the stem. The conductor(19) is connected to the terminal through the cover. The channel(22) is installed at the cover to supply inert gas into the stem. The seal ring(4) is installed between the first and second seal surfaces. The seal ring has larger resistance against heat conduction than those of the plate and the stem. |
