发明名称 Gate-controlled, negative resistance diode device using band-to-band tunneling
摘要 A new gate-controlled, negative resistance diode device is achieved. The device comprises, first, a semiconductor layer in a substrate. The semiconductor layer contains an emitter region and a barrier region. The barrier region is in contact with the emitter region and is laterally adjacent to the emitter region. The semiconductor layer contains a collector region. A drift region comprises the semiconductor layer between the barrier region and the collector region. Finally, a gate comprises a conductor layer overlying the drift region, the barrier region, and at least a part of the emitter region with an insulating layer therebetween. A method of manufacture is achieved.
申请公布号 US2004084689(A1) 申请公布日期 2004.05.06
申请号 US20030696430 申请日期 2003.10.29
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY 发明人 CHI MIN-HWA
分类号 H01L29/739;H01L29/864;(IPC1-7):H01L31/111 主分类号 H01L29/739
代理机构 代理人
主权项
地址