发明名称 Halftone-type phase-shift mask blank, and halftone-type phase-shift mask
摘要 In a halftone-type phase-shift mask blank having a phase shifter film 5, the phase shifter film 5 has a phase adjustment layer 4 for primarily controlling the phase of exposure light, and a transmissivity adjustment layer 3 which is formed between a transparent substrate 2 and the phase adjustment layer 4 and primarily controls the transmissivity of exposure light. The transmissivity adjustment layer 3 has a thickness of 90 angstroms or less.
申请公布号 US2004086788(A1) 申请公布日期 2004.05.06
申请号 US20030421944 申请日期 2003.04.24
申请人 HOYA CORPORATION 发明人 SHIOTA YUKI;NOZAWA OSAMU;MITSUI HIDEAKI;OHKUBO RYO
分类号 G02B5/30;G03F1/00;(IPC1-7):G03F1/08;G02B5/20;F21V9/06 主分类号 G02B5/30
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