发明名称 |
Halftone-type phase-shift mask blank, and halftone-type phase-shift mask |
摘要 |
In a halftone-type phase-shift mask blank having a phase shifter film 5, the phase shifter film 5 has a phase adjustment layer 4 for primarily controlling the phase of exposure light, and a transmissivity adjustment layer 3 which is formed between a transparent substrate 2 and the phase adjustment layer 4 and primarily controls the transmissivity of exposure light. The transmissivity adjustment layer 3 has a thickness of 90 angstroms or less. |
申请公布号 |
US2004086788(A1) |
申请公布日期 |
2004.05.06 |
申请号 |
US20030421944 |
申请日期 |
2003.04.24 |
申请人 |
HOYA CORPORATION |
发明人 |
SHIOTA YUKI;NOZAWA OSAMU;MITSUI HIDEAKI;OHKUBO RYO |
分类号 |
G02B5/30;G03F1/00;(IPC1-7):G03F1/08;G02B5/20;F21V9/06 |
主分类号 |
G02B5/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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