发明名称 METHOD OF MANUFACTURING MICROSTRUCTURE, OPTICAL ELEMENT, INTEGRATED CIRCUIT, AND ELECTRONIC EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a microstructure capable of increasing the retentivity of a liquid material in a desired pattern when forming the desired pattern by using the liquid material, and to provide an optical element, an integrated circuit, and electronic equipment. <P>SOLUTION: A parent liquid area 12 is arranged by providing parent liquid treatment within the area of a desired form of pattern (for example, a pixel area 1), and a liquid repulsive area 11 is arranged outside the parent liquid area 12. It is characterized in that the border between the parent liquid area 12 and the liquid repulsive area 11 is made to have a shape to disperse the force of a liquid material 20 which is filled in a pattern but will go out of the pattern, for example, a saw-tooth pattern. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004133032(A) 申请公布日期 2004.04.30
申请号 JP20020294879 申请日期 2002.10.08
申请人 SEIKO EPSON CORP 发明人 TAKAGI KENICHI;SOGO TOMOHIKO;SAITO YUJI
分类号 G02B5/20;G02F1/1335 主分类号 G02B5/20
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