发明名称 LITHOGRAPHY PROJECTOR AND REFLECTOR ASSEMBLY FOR USING IT
摘要 PROBLEM TO BE SOLVED: To provide a lithography projector provided with a collector whose radioactive heat load is decreased in order to reduce the influence of heat emission from a radioactive source of the lithography projector upon an optical component of the projector, especially the collector. SOLUTION: In this lithography device, an oblique incident collector (50) for generating radiation beam comprises a lot of reflectors. The outside of an inner reflector (42, 43) is coated with an infrared ray reflecting layer (56). The outside of an outer reflector (46) is coated with an infrared ray radiating layer (62). The considerable amount of infrared rays (40) which is made incident on a back surface of the reflector is reflected and radiated to the outside to decrease the heat load of the collector (50) and to improve radiational cooling. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004134794(A) 申请公布日期 2004.04.30
申请号 JP20030341826 申请日期 2003.08.25
申请人 ASML NETHERLANDS BV 发明人 SCHUURMANS FRANK JEROEN PIETER;BAKKER LEVINUS PIETER
分类号 G21K1/06;G03F7/20;G21K5/00;G21K5/02;H01L21/027;(IPC1-7):H01L21/027 主分类号 G21K1/06
代理机构 代理人
主权项
地址