摘要 |
PROBLEM TO BE SOLVED: To provide a lithography projector provided with a collector whose radioactive heat load is decreased in order to reduce the influence of heat emission from a radioactive source of the lithography projector upon an optical component of the projector, especially the collector. SOLUTION: In this lithography device, an oblique incident collector (50) for generating radiation beam comprises a lot of reflectors. The outside of an inner reflector (42, 43) is coated with an infrared ray reflecting layer (56). The outside of an outer reflector (46) is coated with an infrared ray radiating layer (62). The considerable amount of infrared rays (40) which is made incident on a back surface of the reflector is reflected and radiated to the outside to decrease the heat load of the collector (50) and to improve radiational cooling. COPYRIGHT: (C)2004,JPO |