| 摘要 |
A deposited film forming method and apparatus includes a belt-like member continuously conveyed through a film-forming chamber, one side of which is formed of the belt-like member. A reactive gas is introduced into the film-forming chamber, the interior of the film-forming chamber is evacuated, a high-frequency power induces a plasma therein, and a deposited film is formed on the belt-like member A discharge confining means is provided opposite to a deposited film forming side of the belt-like member to maintain constant contact with the belt-like member while it changes shape.
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