MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device for carrying out a plurality of processes by using a chamber which is provided with a valve for obtaining good pressure control over a wide pressure range. SOLUTION: The chamber 1 in which a semiconductor wafer 4 is placed and a vacuum pump 6 are connected through an aperture variable valve 5 which is constituted of a coaxially disposed first control valve 5a and a second circular control valve 5b disposed in the control valve 5a. The aperture is controlled by independently rotating the control valve 5a and the control valve 5b so that the pressure in the chamber 1 is controlled at a given level. COPYRIGHT: (C)2004,JPO