| 摘要 |
PROBLEM TO BE SOLVED: To provide a treatment device that can make the time from the formation of films to the volatilizing treatment the same for all the wafers contained in the same lot and, accordingly, can equally well remove films in a batch. SOLUTION: This treatment device 31 is provided with a NOR batch chamber 37 in which a plurality of wafers having films to be removed on their surfaces is housed and resulted films of reaction are formed by causing the films to be removed to react with a reactive gas, a PHT batch chamber 61 in which the plurality of wafers having the resulted films of reaction formed in the chamber 37 are housed and the resulted films of reaction are sublimed, and a transporter 35 which transports the plurality of wafers between the chambers 37 and 61. COPYRIGHT: (C)2004,JPO
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