| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To realize alignment of a mask and a wafer with high precision by improving the contrast in an image. <P>SOLUTION: An alignment device of the mask and the wafer in an exposure device comprises: two imaging optics which simultaneously image a first mark provided to the mask and a second mark provided to a wafer pallet or the wafer from directions crossing at right angles, while focusing on the first and second marks; and an optical system for lighting. A first squeezing plate in which only an outer part in a concentric circle is light-shielded and a second squeezing plate in which only an inner part in a concentric circle is light-shielded can be mounted. In the first and/or second imaging optics, one of the first squeezing plate and the second squeezing plate is arranged at a position conjugated with an object point of an objective lens. Further, in the optical system for lighting, the other one is arranged at a position conjugated with the object point of the objective lens. <P>COPYRIGHT: (C)2004,JPO</p> |
