发明名称 |
FILM PATTERN FORMATION METHOD, FILM PATTERN FORMATION APPARATUS, CONDUCTING FILM WIRING, ELECTROOPTICAL APPARATUS, ELECTRONIC COMPONENT, AND NONCONTACT CARD MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a film pattern formation method for forming a plurality of patterns different in shape in film pattern forming regions on a substrate, and to provide conducting film wiring or the like obtained by using the method. SOLUTION: The film pattern formation method comprises a first surface processing step for adjusting the substrate surface to be liquid-repellent as desired, a first pattern formation step for forming a first wiring 1 (first pattern) on the substrate surface after the first surface processing step, a second surface processing step for decreasing the liquid-repellency of the substrate surface after the first pattern formation step, and a second pattern formation step for forming a second wiring 2 (second pattern) different in shape from the first wiring 1 on the substrate surface after the second surface processing step. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004119479(A) |
申请公布日期 |
2004.04.15 |
申请号 |
JP20020277506 |
申请日期 |
2002.09.24 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HIRAI TOSHIMITSU;HASEI HIRONOBU |
分类号 |
G02F1/1343;H01L21/28;H01L21/288;H05K3/10;(IPC1-7):H05K3/10 |
主分类号 |
G02F1/1343 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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