摘要 |
Chemical vapor deposition is used to form a film of Bi oxide, Sr oxide, and Ta oxide on a heated substrate by decomposing the precursors of these oxides at the surface of the substrate. The precursor of Bi oxide is a Bi complex which includes at least one carboxylate group and is decomposed and deposited at a temperature lower than 450° C. The film of Bi, Sr, and Ta oxides obtained by low-temperature CVD is predominantly non-ferroelectric, but can be converted into a ferroelectric film by a subsequent heating process. |
申请人 |
INFINEON TECHNOLOGIES AG;ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
HINTERMAIER, FRANK;VAN BUSKIRK, PETER;ROEDER, JEFFREY, R.;HENDRIX, BRYAN;BAUM, THOMAS, H.;DESROCHERS, DEBRA, A. |