| 摘要 |
PURPOSE: Provided is a polymer or copolymer functionalized with at least one hydroxy ester group serving as a protected acid group and suitable for a photoresist for use in the range of 193-157 nm. CONSTITUTION: The photoresist comprises: (a) a polymer functionalized with at least one hydroxy ester group represented by the formula of -CO2-C(R1)(R2)-£C(R3)(R4)|n-C(R5)(R6)-OH; and (b) a photoactive component. In the above formula, n is 0, 1, 2, 3, 4 or 5; each of R1 and R2 is a C1-C6 alkyl optionally substituted with an ethereal oxygen, or R1 and R2 may form a 3- to 8-membered ring optionally substituted with an ethereal oxygen atom, with the proviso that the carbon atom attached to R1 and R2 is not present on the bridge head; each of R3 and R4 is H or a C1-C6 alkyl optionally substituted with an ethereal oxygen atom, or R3 and R4 may form a 3- to 8-membered ring optionally substituted with an ethereal oxygen atom; each of R5 and R6 is H or a C1-C6 alkyl optionally substituted with an ethereal oxygen atom, or R5 and R6 may form a 3- to 8-membered ring optionally substituted with an ethereal oxygen atom, or R1 and R5 may form a 4- to 8-membered ring together with -£C(R3)(R4)|n, with the proviso that the carbon atom attached to R1 and R2 is not present on the bridge head.
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