Self-aligning PVD mark shield

摘要

A new and improved, self-aligning mark shield for PVD chambers. The mark shield of the present invention comprises an annular body having a retainer flange for engaging and retaining a substrate on a substrate support of a process chamber. An annular locating pin is provided on the bottom surface of the body for engaging the substrate support and preventing excessive X- and Y-axis movement of the substrate on the substrate support. The mark shield obviates the need for a standard ceramic isolation assembly to maintain the mark shield in position in the chamber.