发明名称 Semiconductor laser device
摘要 A real index guided semiconductor laser device includes an optical waveguide layer at least on one side of an active layer that has a band gap energy not less than that of the active layer; a cladding layer on an outer side of the optical waveguide layer that has a band gap energy not less than that of the optical waveguide layer; a refractive index control layer having a striped window, buried in the optical waveguide layer by selective growth; and a semiconductor layer formed in the optical waveguide layer by selective growth prior to the selective growth of the refractive index control layer. In a laminated portion including the semiconductor layer and the refractive index control layer, a change in effective refractive index due to a change in thickness of the semiconductor layer is smaller than that of the refractive index control layer.
申请公布号 US6717186(B2) 申请公布日期 2004.04.06
申请号 US20020230988 申请日期 2002.08.30
申请人 MITSUI CHEMICALS, INC. 发明人 FUJIMOTO TSUYOSHI;MURO KIYOFUMI;KOISO TAKESHI
分类号 H01S5/20;H01S5/22;H01S5/223;(IPC1-7):H01L33/00 主分类号 H01S5/20
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