| 摘要 |
PURPOSE: A bake apparatus is provided to be capable of constantly loading a wafer at the same position of a tilted heating plate for carrying out a bake process. CONSTITUTION: A bake apparatus includes a heating plate(40) for loading and baking a wafer. The heating plate is tilted as much as a predetermined angle. The bake apparatus further includes a plurality of stoppers(41) at the predetermined upper portions of the heating plate for stopping a sliding wafer. Preferably, the plurality of stoppers are installed at the lower portion of the upper surface of the heating plate. Preferably, the stoppers are formed along the peripheral portion of the heating plate corresponding to the shape of the wafer. Preferably, the heating plate includes more than two lift pins at both sides using the center portion as a reference.
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