| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid crystal display device and its manufacturing method in which no problem associated with transfer of traces of a stage and an edge of a blind on a display region is caused in pattern forming of a photosensitive organic film. <P>SOLUTION: In the pattern forming of the photosensitive organic film 10 for the purpose of forming a reflection film on a TFT substrate of the reflective or transflective liquid crystal display device or the like, the pattern forming is carried out with three kinds of exposure conditions consisting of an exposure 1 to remove the photosensitive organic film on a terminal region outside the display region, an exposure 2 to remove the photosensitive organic film on a part to form a contact hole or on a transmission region of the display region and an exposure 3 to form irregularities on a reflection region. Furthermore, by making light exposure on the part to form the contact hole or on the transmission region of the display region and that on the terminal region different from each other, in the display region where thickness of the applied film is thinner than that on the terminal region the transfer of an exposure stage due to light reflection from the exposure stage resulting from over exposure is prevented. <P>COPYRIGHT: (C)2004,JPO |
